Lihat sumber Proses 10 nm

Dalam [[fabrikasi semikonduktor]], [[International Technology Roadmap for Semiconductors]] (ITRS) mendefinisikan " '''proses 10 nanometer''' " sebagai simpul teknologi MOSFET yang mengikuti simpul "14 nm".

Setidaknya sejak tahun 1997, "node proses" diberi nama semata-mata atas dasar pemasaran, dan tidak ada hubungannya dengan dimensi pada sirkuit terpadu; baik panjang gerbang, jarak logam, atau jarak gerbang pada perangkat "10nm" adalah sepuluh nanometer. Misalnya, proses " 7 nm " GlobalFoundries secara dimensi mirip dengan proses "10 nm" Intel. Proses "10 nm" TSMC dan Samsung berada di antara proses "14 nm" dan "10 nm" Intel dalam kepadatan transistor . Kepadatan transistor (jumlah transistor per milimeter persegi) lebih penting daripada ukuran transistor, karena transistor yang lebih kecil tidak lagi berarti peningkatan kinerja, atau peningkatan jumlah transistor.<ref>[https://www.eejournal.com/article/no-more-nanometers/ No More Nanometers – EEJournal]. 23 July 2020.</ref><ref>Priyank Shukla. [https://www.design-reuse.com/articles/43316/a-brief-history-of-process-node-evolution.html A Brief History of Process Node Evolution]. ''design-reuse.com''.</ref><ref>Joel Hruska. [https://www.extremetech.com/computing/184946-14nm-7nm-5nm-how-low-can-cmos-go-it-depends-if-you-ask-the-engineers-or-the-economists 14nm, 7nm, 5nm: How low can CMOS go? It depends if you ask the engineers or the economists]. ''ExtremeTech''.</ref><ref>[https://wccftech.com/intel-losing-process-lead-analysis-7nm-2022/ Exclusive: Is Intel Really Starting To Lose Its Process Lead? 7nm Node Slated For Release in 2022]. ''wccftech.com''. 2016-09-10.</ref><ref>[https://www.eejournal.com/article/life-at-10nm-or-is-it-7nm-and-3nm/ Life at 10nm. (Or is it 7nm?) And 3nm - Views on Advanced Silicon Platforms]. ''eejournal.com''. 2018-03-12.</ref><ref>[https://www.tsmc.com/english/dedicatedFoundry/technology/10nm.htm 10nm Technology]. TSMC.</ref><ref>[https://fuse.wikichip.org/news/1425/vlsi-2018-samsungs-11nm-11lpp/ VLSI 2018: Samsung's 11nm nodelet, 11LPP]. ''WikiChip Fuse''. 2018-06-30.</ref><ref>[https://fuse.wikichip.org/news/1443/vlsi-2018-samsungs-8nm-8lpp-a-10nm-extension/ VLSI 2018: Samsung's 8nm 8LPP, a 10nm extension]. ''WikiChip Fuse''. 2018-07-01.</ref>

Semua proses produksi "10 nm" didasarkan pada teknologi [[FinFET]] (fin field-effect transistor), sejenis teknologi MOSFET multi-gerbang yang merupakan evolusi non-planar dari teknologi CMOS silikon planar. Samsung pertama kali memulai produksi chip "kelas 10 nm" pada tahun 2013 untuk chip memori flash multi-level cell (MLC), diikuti oleh SoC mereka yang menggunakan proses 10&nbsp;nm pada tahun 2016. TSMC memulai produksi komersial chip "10 nm" pada tahun 2016, dan Intel kemudian memulai produksi chip "10 nm" pada tahun 2018.

==Node proses==
===Foundry===
{| class="wikitable" style="text-align:center;"
!
! colspan="2" | Aturan Dasar<br />Perangkat Logika ITRS
(2015)
! colspan="5" | [[Samsung Electronics|Samsung]]
! [[TSMC]]
! colspan="2" | [[Intel]]
|-
! style="text-align:left;" | Nama proses
| 16/14&nbsp;nm
| 11/10&nbsp;nm
| 10LPE<br />(10&nbsp;nm)
| 10LPP<br />(10&nbsp;nm)
| 8LPP<br />(8&nbsp;nm)
| 8LPU<br />(8&nbsp;nm)
| 8LPA<br />(8&nbsp;nm)
| 10FF<br />(10&nbsp;nm)
| 10&nbsp;nm<ref>Charlie Demerjian. [https://semiaccurate.com/2018/08/02/intel-guts-10nm-to-get-it-out-the-door/ Intel guts 10nm to get it out the door]. ''SemiAccurate''. 2018-08-02.</ref>
| 10&nbsp;nm SF<br />(10&nbsp;nm)
|-
!Kepadatan transistor (MTr / mm<sup>2</sup>)
|
|
|colspan="2" | 51.82<ref>[https://fuse.wikichip.org/news/1443/vlsi-2018-samsungs-8nm-8lpp-a-10nm-extension/ VLSI 2018: Samsung's 8nm 8LPP, a 10nm extension]. ''WikiChip Fuse''. 2018-07-01.</ref>
|colspan="2" | 61.18<ref>[https://fuse.wikichip.org/news/1443/vlsi-2018-samsungs-8nm-8lpp-a-10nm-extension/ VLSI 2018: Samsung's 8nm 8LPP, a 10nm extension]. ''WikiChip Fuse''. 2018-07-01.</ref>
| ?
|52.51<ref>David Schor. [https://fuse.wikichip.org/news/2261/tsmc-announces-6-nanometer-process/ TSMC Announces 6-Nanometer Process]. ''WikiChip Fuse''. 2019-04-16.</ref>
|colspan="2" |100.76<ref>[https://hexus.net/tech/news/cpu/119699-intel-10nm-density-27x-improved-14nm-node/ Intel 10nm density is 2.7X improved over its 14nm node]. ''HEXUS''.</ref>
|-
! style="text-align:left;" | Transistor gate pitch (nm)
| 70
| 48
| colspan="2" | 68
| colspan="2" | 64
| ?
| 66
| colspan="2" | 54
|-
! style="text-align:left;" | Interconnect pitch (nm)
| 56
| 36
| colspan="2" | 51
| colspan="2" | ?
| ?
| 44
| colspan="2" | 36
|-
! style="text-align:left;" | Transistor fin pitch (nm)
| 42
| 36
| colspan="2" | 42
| colspan="2" | 42
| ?
| 36
| colspan="2" | 34
|-
! style="text-align:left;" | Transistor fin height (nm)
| 42
| 42
| colspan="2" | 49
| colspan="2" | ?
| ?
| 42
| colspan="2" | 53
|-
! style="text-align:left;" | Production year
| 2015
| 2017
| <ref>[https://fuse.wikichip.org/news/1443/vlsi-2018-samsungs-8nm-8lpp-a-10nm-extension/ VLSI 2018: Samsung's 8nm 8LPP, a 10nm extension]. ''WikiChip Fuse''. 2018-07-01.</ref>
| <ref>[https://fuse.wikichip.org/news/1443/vlsi-2018-samsungs-8nm-8lpp-a-10nm-extension/ VLSI 2018: Samsung's 8nm 8LPP, a 10nm extension]. ''WikiChip Fuse''. 2018-07-01.</ref>
| 
| 
| 
| <ref>[https://www.tsmc.com/english/dedicatedFoundry/technology/10nm.htm 10nm Technology]. TSMC.</ref><br />2017 production<ref>[https://www.tsmc.com/english/dedicatedFoundry/technology/10nm.htm 10nm Technology]. TSMC.</ref>
|  <br />([[Cannon Lake (microarchitecture)|Cannon Lake]])<ref>Ian Cutress. [https://www.anandtech.com/show/16823/intel-accelerated-offensive-process-roadmap-updates-to-10nm-7nm-4nm-3nm-20a-18a-packaging-foundry-emib-foveros Intel's Process Roadmap to 2025: with 4nm, 3nm, 20A and 18A?!]. ''AnandTech''. July 26, 2021.</ref>
|  <br />([[Tiger Lake]])<ref>[https://www.anandtech.com/show/16107/what-products-use-intel-10nm-superfin-demystified/3 What Products Use Intel 10nm? SuperFin and 10++ Demystified].</ref>
|}

== Lihat pula ==
* [[International Technology Roadmap for Semiconductors]]
* [[Fabrikasi semikonduktor]]
* [[Fotolitografi]]
* [[Litografi ultraviolet ekstrem]]
* [[Daftar contoh skala semikonduktor]]
* [[Litografi rendam]]
* [[ASML Holding]] pemasok sistem [[fotolitografi]] terbesar, terutama untuk industri [[semikonduktor]].
* [[Semiconductor Equipment and Materials International|SEMI]] — The semiconductor industry trade association
* [[Sirkuit terpadu]]
* [[MOSFET]]
* [[FinFET]]
* [[Multi-gate MOSFET]]
* [[CMOS]]
* [[Transistor]]
* [[Semikonduktor]]
* [[Nanometer]]

== Referensi ==
<references />

== Sumber dan atribusi ==

Konten artikel ini diadaptasi dari [https://id.wikipedia.org/w/index.php?title=Proses+10+nm&oldid=29454913 Wikipedia bahasa Indonesia], revisi 29454913 (2026-07-13T23:49:37Z), yang tersedia berdasarkan lisensi Creative Commons Atribusi-BerbagiSerupa (CC BY-SA). Mohon gunakan konten ini secara bijak serta sesuai dengan ketentuan lisensi yang berlaku.

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